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當前位置：北京華沛智同科技發展有限公司>>Logitech精密材料表面處理>>化學機械研磨拋光>> CMP Orbis柜式化學機械研磨拋光設備
CMP Orbis 柜式化學機械研磨拋光設備簡介：
The Orbis CMP system is a precision engineered, floor standing CMP tool ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum analytical capabilities and enhanced processing performance.
CMP Orbis 柜式化學機械研磨拋光設備特點：
l Multi use processing capability
l Low cost solution – high value results
l Advanced design configuration
l Flexible use of operation
l Consistent, reliable yields
l Enhanced ease of use
CMP Orbis
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